The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2019

Filed:

Jun. 15, 2018
Applicant:

The United States of America As Represented BY the Secretary of the Navy, San Diego, CA (US);

Inventors:

Brittany E. Lynn, San Diego, CA (US);

Alexandru Hening, San Diego, CA (US);

Ryan P. Lu, San Diego, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F41H 13/00 (2006.01);
U.S. Cl.
CPC ...
F41H 13/0031 (2013.01); F41H 13/0062 (2013.01);
Abstract

A method comprising the steps of propagating an infrared laser pulse in air, self-focusing the laser pulse until the laser reaches a critical power density, wherein molecules in the air ionize and simultaneously absorb a plurality of infrared photons resulting in a clamping effect on the intensity of the pulse, wherein the laser pulse defocuses and plasma is created, causing a dynamical competition between the self-focusing of the laser pulse and the defocusing effect due to the created plasma, the laser pulse maintaining a small beam diameter and high peak intensity over large distances, creating a plasma column, repeating the above steps to create a plurality of plasma columns, creating a parallel linear array with the plurality of plasma columns, and using the array to deflect an incident energy.


Find Patent Forward Citations

Loading…