The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2019
Filed:
May. 10, 2019
M-r Advanced Technologies, Llc, Hillsboro, OR (US);
Shankar Rananavare, Hillsboro, OR (US);
Other;
Abstract
Formulations for stabilizing hydrogen peroxide, comprising water soluble Znions at 0.7 to 100 parts per million of an alkaline hydrogen peroxide solution. In some examples, the alkaline hydrogen peroxide solution is a silicon wafer cleaning solution comprised of HOand NHOH—HO and the water soluble Znions are present at 3 to 100 parts per million of the silicon wafer cleaning solution. In some examples, the alkaline hydrogen peroxide solution is a wet etching formulation selective for TiN and the water soluble Znions are present at 0.7 to 10 parts per million of the wet etching formulation. In some examples, the alkaline hydrogen peroxide solution is a wet etching formulation selective for Ti and Zn ions are present at 2 to 7 parts per million.