The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Dec. 19, 2018
Applicant:
Plasma Ion Assist Co., Ltd., Kyoto, JP;
Inventors:
Yasuo Suzuki, Otsu, JP;
Masayasu Tanjo, Nagaokakyo, JP;
Assignee:
Plasma Ion Assist Co., Ltd., Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); H01J 37/32 (2006.01); B29C 59/14 (2006.01); B32B 15/04 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
H05H 1/24 (2013.01); B29C 59/14 (2013.01); B32B 15/04 (2013.01); C23C 16/545 (2013.01); H01J 37/32009 (2013.01);
Abstract
In order to ensure quality even when a sheet-like base material is thin while improving efficiency of production, a plasma treatment apparatus disclosed herein includes a plasma treatment chamber X for treating a sheet-like base material Z with plasma, a high-frequency antennafor generating plasma in the plasma treatment chamber X, and a feeding mechanismfor feeding the sheet-like base material Z into the plasma treatment chamber X in a vertical direction.