The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Aug. 10, 2016
Boe Technology Group Co., Ltd., Beijing, CN;
Ordos Yuansheng Optoelectronics Co., Ltd., Inner Mongolia, CN;
Dongwei Li, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., Inner Mongolia, CN;
Abstract
The present disclosure discloses an alignment mark structure, a mask, a substrate and an alignment method for the mask and the substrate. The alignment mark structure includes: at least two first alignment marks and at least two second alignment marks provided on the mask, a pattern size of the first alignment marks being larger than that of the second alignment marks; at least two third alignment marks and at least two fourth alignment marks provided on the substrate, wherein the number and the location of the third alignment marks correspond to the number and the location of the first alignment marks, respectively, and the number and the location of the fourth alignment marks correspond to the number and the location of the second alignment marks, respectively.