The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2019

Filed:

May. 02, 2016
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Inventors:

Daigo Ito, Kanagawa, JP;

Takahisa Ishiyama, Kanagawa, JP;

Katsuaki Tochibayashi, Kanagawa, JP;

Kazuya Hanaoka, Kanagawa, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 21/67 (2006.01); H01L 27/146 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 27/12 (2006.01); H01L 29/04 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78693 (2013.01); H01L 21/67207 (2013.01); H01L 27/1225 (2013.01); H01L 27/1464 (2013.01); H01L 27/14632 (2013.01); H01L 29/045 (2013.01); H01L 29/42384 (2013.01); H01L 29/66969 (2013.01); H01L 29/7869 (2013.01); H01L 29/78621 (2013.01); H01L 29/78648 (2013.01); H01L 29/78696 (2013.01); H01L 27/124 (2013.01); H01L 27/14621 (2013.01);
Abstract

The semiconductor device includes a first insulating layer; a first oxide insulating layer over the first insulating layer; an oxide semiconductor layer over the first oxide insulating layer; a source electrode layer and a drain electrode layer over the oxide semiconductor layer; a second oxide insulating layer over the oxide semiconductor layer, the source electrode layer, and the drain electrode layer; a gate insulating layer over the second oxide insulating layer; a gate electrode layer over the gate insulating layer; a second insulating layer over the first insulating layer, the source electrode layer, the drain electrode layer, the second oxide insulating layer, the gate insulating layer, and the gate electrode layer; and a third insulating layer over the first insulating layer, the source electrode layer, the drain electrode layer, and the second insulating layer.


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