The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Apr. 10, 2012
Ken Okamoto, Tokyo, JP;
Tadahisa Arahori, Tokyo, JP;
Akishige Sato, Tokyo, JP;
Sachio Miyashita, Tokyo, JP;
Eiji Kusano, Ishikawa, JP;
Muneaki Sakamoto, Ishikawa, JP;
Ken Okamoto, Tokyo, JP;
Tadahisa Arahori, Tokyo, JP;
Akishige Sato, Tokyo, JP;
Sachio Miyashita, Tokyo, JP;
Eiji Kusano, Ishikawa, JP;
Muneaki Sakamoto, Ishikawa, JP;
Ferrotec Ceramics Corporation, Tokyo, JP;
Abstract
A sputtering target which is made of an alumina sintered body having a purity of not less than 99.99% by mass %, a relative density of not less than 98%, and an average grain size of less than 5 μm or is made of an alumina sintered body having a purity of not less than 99.999% by mass % and a relative density of not less than 98%. A sputtered film having an excellent insulation resistance and an excellent homogeneity can be obtained by using the sputtering target.