The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Jan. 10, 2018
Qualcomm Incorporated, San Diego, CA (US);
QUALCOMM Incorporated, San Diego, CA (US);
Abstract
A system utilizing specified occlusion techniques to reduce the overall amount of occlusion computations required to generate an image in a changing viewpoint environment. Viewpoint location changes about a current viewpoint can result in a different image view with the potential exposure of previously occluded portions of a scene image that would now be now visible from that new viewpoint location. To reduce the amount of occlusion computations required to render an associated image in a changing viewpoint environment, techniques are described that reduce occlusion computations using, for example, one or more trim region rendering techniques. Some techniques include generating potential visible set (PVS) information based on a viewport including an original viewpoint location and an anticipated change in viewpoint location.