The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2019

Filed:

Apr. 14, 2014
Applicant:

Enplas Corporation, Saitama, JP;

Inventor:

Tomohiro Saito, Saitama, JP;

Assignee:

ENPLAS CORPORATION, Saitama, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 3/08 (2006.01); B29C 33/38 (2006.01); B29C 33/42 (2006.01); G02B 13/00 (2006.01); F21V 5/04 (2006.01); F21Y 115/10 (2016.01);
U.S. Cl.
CPC ...
G02B 3/08 (2013.01); B29C 33/3842 (2013.01); B29C 33/42 (2013.01); B29K 2905/00 (2013.01); F21V 5/045 (2013.01); F21Y 2115/10 (2016.08); G02B 13/00 (2013.01);
Abstract

In a light flux controlling member (), light emitted from a light-emitting element enters from an incidence region (), and is emitted from an emitting region (). The light-incidence region () includes a plurality of protrusions. The protrusions have ridgelines that are connected between two of four virtual lines that are adjacent to each other, the virtual lines joining an intersecting point and a vertex point of diagonal lines of a first virtual quadrangle. Valleys are formed between the plurality of protrusions. The planar shape of the ridge lines is an arc, and the radius of curvature of the ridge lines is greater than the distance from the intersection point of the diagonal lines of the first virtual quadrangle to the midpoint of the ridge lines.


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