The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Jul. 20, 2016
Applicant:
Delta Electronics, Inc., Taoyuan, TW;
Inventors:
Shih-Lin Huang, Taoyuan, TW;
Ting-Yuan Wu, Taoyuan, TW;
Chiu-Kung Chen, Taoyuan, TW;
Chun-Lung Chiu, Taoyuan, TW;
Assignee:
DELTA ELECTRONICS, INC., Taoyuan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F28D 15/04 (2006.01); F28F 3/00 (2006.01); F28F 13/06 (2006.01); F28D 21/00 (2006.01);
U.S. Cl.
CPC ...
F28D 15/046 (2013.01); F28F 3/00 (2013.01); F28F 13/06 (2013.01); F28D 2021/0028 (2013.01); F28F 2225/04 (2013.01); F28F 2255/18 (2013.01);
Abstract
A slim vapor chamber includes a first plate, a second plate and a capillary structure. The periphery of the second plate is connected with that of the first plate to form a chamber. The capillary structure is disposed in the chamber. At least one of a side of the first plate facing the second plate and a side of the second plate facing the first plate is formed with a plurality of supporting structures, which include a plurality of supporting pillars and a plurality of supporting plates, by an etching process.