The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
May. 18, 2016
Schott Ag, Mainz, DE;
Carsten Renz, Escherhausen, DE;
Marten Walther, Alfeld, DE;
Lothar Niessner, Duingen, DE;
Martin Feichtinger, Delligsen, DE;
Bianca Schreder, Sulzbach, DE;
Junming Xue, Shanghai, CN;
Sean Qian, Shanghai, CN;
SCHOTT AG, Mainz, DE;
Abstract
A method for production of a photo-structurable glass element is provided. The method includes the steps of: fixing a blank of photo-structurable glass at a first end; heating of a deformation zone of the blank; and drawing the blank. The glass includes Si, a crystal-agonist, a crystal-antagonist, and a pair of nucleating agents. The crystal-agonist is selected from the group consisting of Na, K, Li, and any combinations thereof. The crystal-antagonist is selected from the group consisting of Al, B, Zn, Sr, Sb, and any combinations thereof. The pair of nucleating agents include cerium and an agent selected from the group consisting of silver, gold, copper, and any combinations thereof. The crystal-agonist has a molar proportion cat.-% in relation to a molar proportion of Sithat is at least 0.3 and at most 0.85.