The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Apr. 05, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Martin A. Hilkene, Gilroy, CA (US);
David K. Carlson, San Jose, CA (US);
Matthew D. Scotney-Castle, Morgan Hill, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 5/00 (2006.01); B08B 7/00 (2006.01); H01J 37/32 (2006.01); C30B 25/14 (2006.01); C30B 29/06 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0035 (2013.01); C30B 25/14 (2013.01); C30B 29/06 (2013.01); H01J 37/32357 (2013.01); H01J 2237/335 (2013.01);
Abstract
Embodiments of the present disclosure generally relate to a methods and apparatuses for cleaning exhaust systems, such as exhaust systems used with process chambers for the formation of epitaxial silicon. The exhaust system includes a remote plasma source for supplying ionized gas through the exhaust system, and one or more temperature sensors positioned downstream of the remote plasma source.