The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
May. 09, 2017
Stamicarbon B.v., Sittard, NL;
Brian Sayre Higgins, Sittard, NL;
John Marshall Tate, III, Sittard, NL;
Robert Arthur Yates, Sittard, NL;
Marcel Julien Pomerleau, Sittard, NL;
Jon Michael Heon, Sittard, NL;
Wilfried Marc Renaat Dirkx, Sittard, NL;
Juan Coloma González, Sittard, NL;
Stamicarbon B.V., Sittard, NL;
Abstract
Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m/h)/(m/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile