The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

Mar. 16, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Kristian Samuel Cujia Pena, Rueschlikon, CH;

Thilo Hermann Stoeferle, Rueschlikon, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 5/10 (2006.01); H01S 5/183 (2006.01); H01S 5/42 (2006.01); G02B 5/18 (2006.01); G02B 5/28 (2006.01); H01S 5/20 (2006.01);
U.S. Cl.
CPC ...
H01S 5/1042 (2013.01); H01S 5/18319 (2013.01); H01S 5/18361 (2013.01); H01S 5/423 (2013.01); G02B 5/1809 (2013.01); G02B 5/288 (2013.01); H01S 5/2027 (2013.01); H01S 5/2086 (2013.01);
Abstract

Embodiments are notably directed to a vertical microcavity. The vertical microcavity includes a first reflector and a second reflector, each of which includes one or more material layers extending perpendicular to a vertical axis x. The cavity may further include a confinement region extending between the first reflector and the second reflector, so as to be able to confine an electromagnetic wave. The confinement region may include a single layer material, which is structured so as to create an effective refractive index variation for the electromagnetic wave to be confined, in an average plane of the single layer material, perpendicularly to said vertical axis x. Additional examples are further directed to related microcavity systems and methods of fabrication.


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