The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Feb. 17, 2017
Sharp Kabushiki Kaisha, Sakai, Osaka, JP;
Takao Saitoh, Sakai, JP;
Yohsuke Kanzaki, Sakai, JP;
Kazuatsu Ito, Sakai, JP;
Seiji Kaneko, Sakai, JP;
SHARP KABUSHIKI KAISHA, Sakai, Osaka, JP;
Abstract
A method includes a conductive film forming process of forming a conductive filmcovering a gate insulation film IS and a semiconductor film, the gate insulation filmcovering a gate electrodeG and a gate lineG formed on a glass substrateand the semiconductor filmformed on the gate insulation filmwhile overlapping the gate electrodeG, a first etching process of etching the conductive filmand forming a source conductive filmS connected to the semiconductor filmand a drain conductive filmD connected to the semiconductor film, a resist forming process performed after the first etching process and forming a resistR covering the semiconductor film, the source conductive filmS, and the drain conductive filmD, and a second etching process performed after the resist forming process and performing etching for removing the conductive filmwhile using the resistR as a mask.