The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

Nov. 24, 2017
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Hefei Xinsheng Optoelectronics Technology Co., Ltd., Anhui, CN;

Inventors:

Shiju Zhang, Beijing, CN;

Guoquan Liu, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G02F 1/1362 (2006.01); G02F 1/1335 (2006.01); G02F 1/13 (2006.01);
U.S. Cl.
CPC ...
H01L 27/124 (2013.01); G02F 1/1309 (2013.01); G02F 1/133516 (2013.01); G02F 1/136259 (2013.01); G02F 1/136286 (2013.01); H01L 27/1244 (2013.01); G02F 2001/133521 (2013.01); G02F 2001/136263 (2013.01); G02F 2001/136295 (2013.01);
Abstract

An array substrate, a manufacturing method and a maintenance method thereof, and a display device. The array substrate includes a base substrate, a signal line layer, a color filter layer, and a common line layer. The signal line layer includes multiple signal lines. The common line layer includes a plurality of first common lines and second common lines. An orthographic projection of each signal line on the base substrate is substantially parallel to an orthographic projection of each second common line on the base substrate. An orthographic projection of each signal line on the base substrate and orthographic projections of the plurality of first common lines on the base substrate have overlapping areas. A via hole penetrates the color filter layer, and an orthographic projection of the via hole on the base substrate at least partially overlaps the overlapping area.


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