The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Jun. 19, 2018
Elemental Scientific, Inc., Omaha, NE (US);
Michael Paul Field, Papillion, NE (US);
Jordan Krahn, Omaha, NE (US);
ELEMENTAL SCIENTIFIC, INC., Omaha, NE (US);
Abstract
Systems and methods for measuring analytes (e.g., potassium) under hot plasma conditions of ICP analysis systems (e.g., ICP-MS, ICP-AES, etc.) are described, where a membrane desolvation unit and nitrogen flow gas are included to reduce Argon interferences. A system embodiment includes a heated spray chamber configured to receive a liquid sample and a sample gas to aerosolize the liquid sample; a first condenser coupled to the heated spray chamber; a second condenser coupled to the first condenser; a heated membrane coupled to the second condenser; and a gas introduction component coupled to the heated membrane to receive a flow of gas and to combine the flow of gas with a dried sample aerosol leaving the heated membrane, wherein the flow of gas is introduced at a rate of approximately 2.67 percent to approximately 20 percent of a flow rate of the sample gas.