The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

May. 19, 2017
Applicants:

Nedal Saleh, Woodbridge, CT (US);

Waqas Khalid, Woodbridge, CT (US);

Faisal Saleh, Woodbridge, CT (US);

Inventors:

Nedal Saleh, Woodbridge, CT (US);

Waqas Khalid, Woodbridge, CT (US);

Faisal Saleh, Woodbridge, CT (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); B01F 13/00 (2006.01); B01L 3/00 (2006.01); B01J 19/00 (2006.01); C12Q 1/6837 (2018.01); G01N 1/38 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3233 (2013.01); B01F 13/0064 (2013.01); B01J 19/0093 (2013.01); B01L 3/5023 (2013.01); B01L 3/5027 (2013.01); B01L 3/502715 (2013.01); B01L 3/502753 (2013.01); C12Q 1/6837 (2013.01); H01J 37/3244 (2013.01); H01J 37/3299 (2013.01); H01J 37/32366 (2013.01); H01J 37/32733 (2013.01); B01J 2219/00781 (2013.01); B01J 2219/00869 (2013.01); B01L 2200/06 (2013.01); B01L 2300/0645 (2013.01); B01L 2300/0654 (2013.01); B01L 2300/0681 (2013.01); B01L 2300/1827 (2013.01); B01L 2400/0688 (2013.01); G01N 1/38 (2013.01); H01J 2237/327 (2013.01); H01J 2237/334 (2013.01);
Abstract

A spatially selective surface functionalization device configured to generate a pattern of micro plasmas and functionalize a substrate surface may include: a pattern management system, a patterning head, and a gas delivery system, wherein the gas delivery system provides a primed gas mixture for forming a plasma between the patterning head and a target substrate below the patterning head. A patterning head may generate a distribution of micro plasmas from individual directed beams of electrons with spatial separation. A pattern management system may store and manipulate information about a pattern of surface functionalization and generate instructions for regulating a distribution of micro plasmas that functionalize a substrate surface.


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