The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

Feb. 09, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Tosiya Asano, Utsunomiya, JP;

Takahiro Yoshida, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/00 (2006.01); B29C 43/58 (2006.01); B29C 43/04 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7034 (2013.01); B29C 43/58 (2013.01); G03F 7/0002 (2013.01); B29C 43/04 (2013.01); B29C 2043/5808 (2013.01); B29C 2043/5833 (2013.01);
Abstract

The present invention provides an imprint apparatus which forms a pattern in an imprint material on a shot region of a substrate by using a mold, the apparatus comprising a stage that can move while holding the substrate, and a control unit configured to control relative positions of the mold and the shot region so as to reduce a shift in the relative positions caused by tilting the stage when bringing the mold and the imprint material into contact with each other, based on a contacting force of bringing the mold and the imprint material into contact with each other, and a distance from a reference position of the substrate to the shot region.


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