The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

Jul. 14, 2017
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Hefei Xinsheng Optoelectronics Technology Co., Ltd., Anhui, CN;

Inventors:

Liping Liu, Beijing, CN;

Nanhong Zhang, Beijing, CN;

Zhanfeng Tang, Beijing, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1362 (2006.01); G02F 1/1337 (2006.01); G02F 1/1368 (2006.01); H01L 27/12 (2006.01); G02F 1/1333 (2006.01); H01L 33/38 (2010.01);
U.S. Cl.
CPC ...
G02F 1/136227 (2013.01); G02F 1/1337 (2013.01); G02F 1/1362 (2013.01); G02F 1/1368 (2013.01); G02F 1/136286 (2013.01); H01L 27/124 (2013.01); H01L 27/1214 (2013.01); G02F 2001/133357 (2013.01); G02F 2001/136295 (2013.01); G02F 2201/121 (2013.01); G02F 2201/123 (2013.01); H01L 27/1248 (2013.01); H01L 33/38 (2013.01);
Abstract

The application discloses an array substrate and a display device, and belongs to the field of display technology. The array substrate comprises a base substrate, and a via hole and a diffusion part above the base substrate, and an orthographic projection of the diffusion part on the base substrate is contiguous to that of the via hole on the base substrate. The diffusion part is used for causing alignment liquid at a position corresponding to the via hole to diffuse. Since the array substrate is provided with the diffusion part for causing alignment liquid at a position corresponding to the via hole to diffuse, and the orthographic projection of the diffusion part on the base substrate is contiguous to that of the via hole on the base substrate, the alignment liquid at the position corresponding to the via hole will be guided by the diffusion part to diffuse uniformly.


Find Patent Forward Citations

Loading…