The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

Apr. 06, 2016
Applicant:

Sakura Finetek U.s.a., Inc., Torrance, CA (US);

Inventors:

Paul Hing, Owingen-Billafingen, DE;

Sven Hensler, Gaienhofen, DE;

Assignee:

Sakura Finetek U.S.A., Inc., Torrance, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/36 (2006.01); G02B 21/08 (2006.01); G02B 21/18 (2006.01); G02B 7/09 (2006.01); G02B 21/24 (2006.01);
U.S. Cl.
CPC ...
G02B 21/365 (2013.01); G02B 7/09 (2013.01); G02B 21/08 (2013.01); G02B 21/18 (2013.01); G02B 21/247 (2013.01);
Abstract

The invention is based on an autofocus method in which light from a light source is focused at a measurement light focus in a sample and is reflected from there and the reflected light is guided through an optical system in two light paths onto at least two detector elements. In order to achieve fast and accurate automatic focusing on the sample, it is proposed that the measurement light focus is moved in layers of the sample which reflect light to different extents, and the detector elements are arranged in such a way that, in this case, profiles of a radiation property registered by the detector elements are different and a focus position is set in a manner dependent on the profiles.


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