The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Nov. 15, 2016
National Technology & Engineering Solutions of Sandia, Llc, Albuquerque, NM (US);
Cameron Musgrove, Albuquerque, NM (US);
Richard M. Naething, Albuquerque, NM (US);
Douglas L. Bickel, Albuquerque, NM (US);
National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US);
Abstract
Various technologies for mitigating interference artifacts in multi-pass synthetic aperture radar (SAR) imagery are described herein. First and second phase histories corresponding to first and second SAR passes over a scene are processed in image and phase-history domains to correct for spatially-variant and constant phase offsets between the phase histories that can be caused by known and unknown variations in motion of a SAR platform between passes. Data samples from one phase history can then be replaced with data samples from the other phase history to remove artifacts and distortions caused by sources of interference in the scene.