The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

May. 05, 2017
Applicant:

Saab Ab, Linkoeping, SE;

Inventor:

Christer Zaetterqvist, Uppsala, SE;

Assignee:

SAAB AB, Linkoeping, SE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F41A 27/00 (2006.01); F42B 5/15 (2006.01); B64D 1/02 (2006.01); B64D 7/00 (2006.01); F41H 11/02 (2006.01); F41A 21/42 (2006.01); F41F 1/08 (2006.01); F42B 12/70 (2006.01); F41F 7/00 (2006.01);
U.S. Cl.
CPC ...
F42B 5/15 (2013.01); B64D 1/02 (2013.01); B64D 7/00 (2013.01); F41A 21/42 (2013.01); F41F 1/085 (2013.01); F41H 11/02 (2013.01); F41F 7/00 (2013.01); F42B 12/70 (2013.01);
Abstract

A magazine for storing and launching countermeasures arranged in cartridges, comprising a plurality of longitudinal cartridge cases forming the magazine, where the magazine comprises a tilting means adapted to tilt the cartridge cases, such that the openings of the cartridge cases can be directed in a selected direction, and where a countermeasure comprises multiple projectiles, and where the magazine is adapted to launch a first countermeasure and a second countermeasure, where the projectile cluster density of the first countermeasure is lower than the projectile cluster density of the second countermeasure. The advantage of the invention is that a countermeasure can be directed towards an incoming object and can be adapted for the distance to the object before it is launched.


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