The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Feb. 10, 2017
Shino-test Corporation, Tokyo, JP;
Naomi Iizuka, Sagamihara, JP;
Atsushi Hikichi, Sagamihara, JP;
Shino-Test Corporation, Tokyo, JP;
Abstract
Provided is a process for producing a substrate solution for measuring lipase activity including, as a substrate for measuring lipase activity, 1,2-o-dilauryl-rac-glycero-3-glutaric acid (6'-methylresorufin) ester, wherein the production process does not necessitate cumbersome or special processing such that skill is required, or does not necessitate a special apparatus, instruments, or other items. This production process is a process for producing a substrate solution for measuring lipase activity, and is characterized by including the steps of (1) mixing the substrate for measuring lipase activity and a side-chain-type nonreactive polyether-modified-type modified silicone oil or a polyoxyethylene/polyoxypropylene condensate to prepare a mixture, and (2) mixing all or a portion of the mixture of step (1) with water or an aqueous solution.