The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Jun. 05, 2014
Kuraray Co., Ltd., Kurashiki-shi, JP;
Public University Corporation Yokohama City University, Yokohama-shi, JP;
Yoko Ejiri, Tsukuba, JP;
Satoru Ayano, Tsukuba, JP;
Naoto Fukuhara, Tsukuba, JP;
Hideki Taniguchi, Yokohama, JP;
Takanori Takebe, Yokohama, JP;
CORNING INCORPORATED, Corning, NY (US);
PUBLIC UNIVERSITY CORPORATION YOKOHAMA CITY UNIVERSITY, Yokohama-shi, Kanagawa, JP;
Abstract
A culture chamber includes a plurality of recesses () each formed of a bottom portion () and an opening portion (). The bottom portion () has a hemispherical shape and the opening portion () is defined by a wall that surrounds an area from a boundary between the opening portion () and the bottom portion () to an end of each of the recesses (), the wall having a taper angle in a range from 1 degree to 20 degrees. An equivalent diameter of the boundary is in a range from 50 μm to 2 mm and a depth from a bottom of the bottom portion () to the end of each of the recesses is in a range from 0.6 or more times to 3 or less times the equivalent diameter, and the wall defining the opening portion () forms a surface continuous to the bottom portion ().