The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Dec. 25, 2015
Nitto Denko Corporation, Ibaraki-shi, Osaka, JP;
Hiromoto Haruta, Ibaraki, JP;
Hiroyuki Takemoto, Ibaraki, JP;
Daisuke Hattori, Ibaraki, JP;
Kozo Nakamura, Ibaraki, JP;
NITTO DENKO CORPORATION, Osaka, JP;
Abstract
The present invention provides a coating material that allows a structure with void spaces having a strength and flexibility to be formed. The coating material of the present invention includes: pulverized products of a gelled silicon compound obtained from a silicon compound containing at least three or less functional groups having saturated bonds; and a dispersion medium, wherein the pulverized product contains a residual silanol group. The method of producing a coating material according to the present invention includes steps of: causing gelation of a silicon compound containing at least three or less functional groups having saturated bonds and mixing the gelled silicon compound and a dispersion medium. According to the coating material of the present invention, for example, a coating film is formed by coating a base with the coating material and a porous structure is formed by chemically bonding the pulverized products contained in the coating film.