The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2019

Filed:

Jan. 07, 2015
Applicant:

Ilika Technologies Limited, Southampton, Hampshire, GB;

Inventors:

Duncan Clifford Alan Smith, North Baddesley, GB;

Brian Elliott Hayden, Lyndhurst, GB;

Christopher Edward Lee, Southampton, GB;

Alexandros Anastasopoulos, Cambridge, MA (US);

Laura Mary Perkins, Southampton, GB;

Kyle James Hutchings, Salisbury, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/04 (2006.01); C23C 14/58 (2006.01); H01M 4/1391 (2010.01); H01M 4/525 (2010.01); H01M 10/0525 (2010.01); H01M 10/0585 (2010.01); H01M 4/505 (2010.01); C23C 14/06 (2006.01); H01M 10/0562 (2010.01); C03C 4/18 (2006.01); C23C 14/00 (2006.01); C23C 14/08 (2006.01); H01M 10/052 (2010.01); H01M 10/058 (2010.01); H01M 4/02 (2006.01);
U.S. Cl.
CPC ...
H01M 4/0423 (2013.01); C03C 4/18 (2013.01); C23C 14/0021 (2013.01); C23C 14/0676 (2013.01); C23C 14/08 (2013.01); C23C 14/58 (2013.01); H01M 4/0421 (2013.01); H01M 4/1391 (2013.01); H01M 4/505 (2013.01); H01M 4/525 (2013.01); H01M 10/052 (2013.01); H01M 10/058 (2013.01); H01M 10/0525 (2013.01); H01M 10/0562 (2013.01); H01M 10/0585 (2013.01); H01M 2004/028 (2013.01); H01M 2300/0071 (2013.01);
Abstract

A vapor deposition method for preparing a multi-layered thin film structure comprises providing a vapor source of each component element of a compound intended for a first layer and a compound intended for a second layer, wherein the vapor sources comprise at least a source of lithium, a source of oxygen, a source or sources of one or more glass-forming elements, and a source or sources of one or more transition metals; heating a substrate to a first temperature; co-depositing component elements from at least the vapor sources of lithium, oxygen and the one or more transition metals onto the heated substrate wherein the component elements react on the substrate to form a layer of a crystalline lithium-containing transition metal oxide compound; heating the substrate to a second temperature within a temperature range of substantially 170° C. or less from the first temperature; and co-depositing component elements from at least the vapor sources of lithium, oxygen and the one or more glass-forming elements onto the heated substrate wherein the component elements react on the substrate to form a layer of an amorphous lithium-containing oxide or oxynitride compound.


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