The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Feb. 12, 2018
Wuhan China Star Optoelectronics Technology Co., Ltd., Wuhan, Hubei, CN;
Shuanghua Zeng, Hubei, CN;
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD., Wuhan, Hubei, CN;
Abstract
A mask includes a plurality of completely-transmitting sections and a plurality of light-blocking sections. The completely-transmitting sections and the light-blocking sections are arranged alternate with each other. The light-blocking sections each include a non-light-transmitting sub-section and N light-transmitting sub-sections arranged between the non-light-transmitting sub-section and an adjacent one of the completely-transmitting sections. The N light-transmitting sub-sections have light transmission rates that are increased, step by step, in a direction from the non-light-transmitting sub-section to the completely-transmitting section, where N≥22 and N is an inter. Through modification of the structure of mask, grooves formed in a planarization layer of a non-display section with such a modified mask would have sidewalk that are smooth and the sidewalls having gentle slopes so that no residue of photoresist remains in a subsequent process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile