The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Jan. 17, 2019
Headway Technologies, Inc., Milpitas, CA (US);
Ying Liu, San Jose, CA (US);
Yue Liu, Fremont, CA (US);
Kei Hirata, Sunnyvale, CA (US);
Yuhui Tang, Milpitas, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A PMR writer is disclosed with a leading shield in which a lower (LS2) layer, a middle LS1 layer, and an upper leading edge taper (LET) layer have a damping parameter≥0.04, and extend from an air bearing surface (ABS) to a first height (h1) from the ABS. The LS2 layer has a notch filled with dielectric material at the air bearing surface (ABS) that extends to a height≤h1, or may be completely replaced with dielectric material. Two notch front sides each form an angle β with the LS1 bottom surface, and two notch inner sides between the ABS and LS2 backside form angle δ with the ABS where each of β and δ is from 10 degrees to 170 degrees. Accordingly, bits per square inch performance is improved while substantially maintaining tracks per square inch capability for an overall gain in area density capability.