The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Dec. 16, 2014
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Masaki Imai, Saitama, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70641 (2013.01); G03F 9/7026 (2013.01);
Abstract
The present invention provides a lithography apparatus which forms a pattern on a substrate with a beam, the apparatus comprising a stage configured to hold the substrate and be movable, and a controller configured to control focus driving of the stage based on a measurement value obtained for the focus driving with respect to a measurement point on the substrate and a correction value for the measurement value, wherein the controller is configured to generate the correction value so as to reduce a focus error in a case where the stage is driven based on the measurement value.