The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Mar. 01, 2018
Toshiba Memory Corporation, Minato-ku, JP;
Yoshimitsu Kato, Yokkaichi, JP;
Toshiba Memory Corporation, Minato-ku, JP;
Abstract
According to one embodiment, there is provided an exposure apparatus, including a focus detecting system, a stage, and a controller. On the stage, a substrate is to be mounted. The controller performs focus measurement on an incomplete shot area, part of which is outside a pattern forming area of the substrate, by the focus detecting system. The controller obtains amounts of defocus of a plurality of planes that are candidates for approximating the incomplete shot area according to the result of measuring the incomplete shot area. The controller decides on a plane to approximate the incomplete shot area from among the plurality of planes according to the amounts of defocus of the plurality of planes. The controller drives the stage using a focus-leveling value according to the decided-on plane so as to control a surface position of the incomplete shot area.