The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Jul. 19, 2013
Nippon Kayaku Kabushiki Kaisha, Chiyoda-ku, Tokyo, JP;
Polatechno Co., Ltd., Joetsu-shi, Niigata, JP;
Yoshihiko Taira, Tokyo, JP;
Ryota Nakashima, Tokyo, JP;
Nippon Kayaku Kabushiki Kaisha, Tokyo, JP;
Polatechno Co., Ltd., Niigata, JP;
Abstract
[Problem] To provide: a photosensitive resin composition which is cured by radiation and exhibits excellent wear resistance, antifouling properties, marker pen ink wiping-off properties, fingerprint wiping-off properties and low refractive index, and which provides low reflectance in cases where the photosensitive resin composition is used for an antireflection film; and an antireflection film which has a cured coating film of this photosensitive resin composition. [Solution] A photosensitive resin composition for an antireflection film that is characterized in that a low refractive index layer contains an acrylate, a colloidal silica, and an organic modified dimethyl polysiloxane having an acryloyl group and an acrylate-modified perfluoropolyether that serve as surface modification agents; and an antireflection film which is obtained by curing the photosensitive resin composition.