The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2019

Filed:

Mar. 26, 2018
Applicant:

Korea Institute of Science and Technology, Seoul, KR;

Inventors:

Yong-Sang Ryu, Seoul, KR;

Chulki Kim, Seoul, KR;

Young Min Jhon, Seoul, KR;

Sin-Doo Lee, Seoul, KR;

Eui-Sang Yu, Seoul, KR;

Jae Hun Kim, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/41 (2006.01); H01J 37/305 (2006.01); G01N 21/552 (2014.01); G01N 21/27 (2006.01); H01L 31/09 (2006.01);
U.S. Cl.
CPC ...
G01N 21/4133 (2013.01); G01N 21/27 (2013.01); G01N 21/554 (2013.01); H01J 37/3056 (2013.01); H01L 31/09 (2013.01); H01J 2237/3174 (2013.01);
Abstract

A method for manufacturing an optical sensor includes forming a reflective metal layer on a substrate, forming an insulator layer on the reflective metal layer, inducing self-assembly of a metal nanostructure layer on the insulator layer, and selectively etching the insulator layer through a reactive ion etching process to form a plurality of pillars and a plurality of spaces defined by the plurality of pillars. The method for manufacturing a plasmonic optical sensor according to this embodiment facilitates the formation of nanostructures difficult to pattern and form on the large scale at a low cost, and provides a plasmonic optical sensor with repeatability.


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