The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2019

Filed:

Dec. 13, 2016
Applicant:

Silcotek Corp., Bellefonte, PA (US);

Inventor:

David A. Smith, Bellefonte, PA (US);

Assignee:

SILCOTEK CORP, Bellefonte, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/56 (2006.01); C23C 16/24 (2006.01); B32B 15/00 (2006.01); B05D 5/08 (2006.01); B08B 17/02 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/56 (2013.01); B05D 5/08 (2013.01); B08B 17/02 (2013.01); B32B 15/00 (2013.01); C23C 16/24 (2013.01); C23C 16/401 (2013.01); C23C 16/402 (2013.01); C23C 16/45523 (2013.01);
Abstract

Thermal chemical vapor deposition treatment is disclosed. Specifically, a thermal chemical vapor deposition treated article includes a substrate, and an oleophobic treatment to the substrate, the oleophobic treatment having oxygen, carbon, silicon, fluorine, and hydrogen. The oleophobic treatment has a treatment thickness of less than 600 nm and a heterogeneous wetting regime. The thermal chemical vapor deposition process includes positioning an article within a thermal chemical vapor deposition chamber, thermally reacting dimethylsilane to produce a layer, oxidizing the layer to produce an oxidized layer, and fluoro-functionalizing the oxidized layer to produce an oxidized then fluoro-functionalizing dimethylsilane chemical vapor deposition treatment. The oxidized then fluoro-functionalizing dimethylsilane chemical vapor deposition treatment has a treatment thickness of less than 600 nm and a heterogeneous wetting regime.


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