The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Aug. 26, 2017
Applicants:
Sfc Co., Ltd., Cheongju-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Inventors:
Sung-Wan Pyo, Daejeon, KR;
Oun-Gyu Lee, Cheongju-si, KR;
Young-Hwan Park, Cheongju-si, KR;
Myeong-Suk Kim, Yongin-si, KR;
Soung Wook Kim, Yongin-si, KR;
Assignees:
SFC CO., LTD., Cheongju-si, KR;
SAMSUNG DISPLAY CO., LTD., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); B05D 1/00 (2006.01); C23C 14/12 (2006.01); C23C 14/56 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
B05D 1/60 (2013.01); C23C 14/12 (2013.01); C23C 14/564 (2013.01); H01L 51/0031 (2013.01);
Abstract
Disclosed is an apparatus for evaluation of a deposition process in organic thin film-manufacturing processes using a chamber employing a deposition-preventing plate, by which it can be predicted whether a thin film layer formed on the deposition-preventing plate will be delaminated. Also provided is a method for evaluating a deposition process of an organic material, using the apparatus.