The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Oct. 25, 2016
Kimberly-clark Worldwide, Inc., Neenah, WI (US);
Xuedong Song, Alpharetta, GA (US);
Kimberly-Clark Worldwide, Inc., Neenah, WI (US);
Abstract
A substrate includes a double-network polymer system including a cross-linked, covalently-bonded polymer and a reversible, partially ionicly-bonded polymer, wherein the substrate has a moisture level less than or equal to 15 percent of the total weight of the substrate, wherein the substrate is porous, and wherein the substrate includes a latent retractive force. A method for manufacturing a substrate includes producing a double-network hydrogel including a cross-linked, covalently-bonded polymer and a reversible, ionicly-bonded polymer; elongating by force the double-network hydrogel in at least one direction; treating the double-network hydrogel with an organic solvent with a volatile and water-miscible organic solvent to replace a majority of water within the double-network hydrogel; evaporating the organic solvent while the double-network hydrogel is still elongated to form a substantially-dried double-network polymer system; and releasing the force to produce the substrate.