The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Sep. 13, 2017
Applicant:
Ngk Insulators, Ltd., Nagoya, JP;
Inventors:
Aya Miura, Nagoya, JP;
Masahiro Furukawa, Nagoya, JP;
Assignee:
NGK Insulators, Ltd., Nagoya, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 61/14 (2006.01); B01D 69/02 (2006.01); B01D 71/02 (2006.01); B01D 71/06 (2006.01); B01D 61/36 (2006.01); B01D 63/06 (2006.01);
U.S. Cl.
CPC ...
B01D 71/021 (2013.01); B01D 61/145 (2013.01); B01D 61/362 (2013.01); B01D 63/066 (2013.01); B01D 69/02 (2013.01); B01D 71/027 (2013.01); B01D 71/06 (2013.01); B01D 2325/02 (2013.01); B01D 2325/04 (2013.01); B01D 2325/20 (2013.01); B01D 2325/30 (2013.01);
Abstract
A silica membrane filterincludes a porous substrateand a silica membraneformed on the porous substrate, the silica membranehaving an aryl group. The silica membranehas an atomic ratio Si/C, as determined by elemental analysis using energy-dispersive X-ray spectrometry (EDX), in the range of 0.2 to 15. The silica membranepreferably has a thickness in the range of 30 nm to 300 nm and an X/Y, a ratio of an absorption intensity X of a Si—O—Si bond to an absorption intensity Y based on the aryl group in a Fourier transform infrared absorption spectrum (FT-IR), in the range of 5.0 to 200.