The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2019

Filed:

Nov. 10, 2015
Applicant:

Koninklijke Philips N.v., Eindhoven, NL;

Inventors:

Thomas Koehler, Norderstedt, DE;

Ewald Roessl, Ellerau, DE;

Rolf Karl Otto Behling, Norderstedt, DE;

Peter Benjamin THeodor Noel, Munich, DE;

Franz Pfeiffer, Unterföhring, DE;

Assignee:

KONINKLIJKE PHILIPS N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 6/03 (2006.01); A61B 6/00 (2006.01); H01J 35/14 (2006.01); G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
A61B 6/032 (2013.01); A61B 6/4035 (2013.01); A61B 6/4085 (2013.01); A61B 6/484 (2013.01); G02B 5/1866 (2013.01); H01J 35/14 (2013.01); G21K 2207/005 (2013.01); H01J 2235/082 (2013.01); H01J 2235/086 (2013.01);
Abstract

The invention relates to a source-detector arrangement () of an X-ray apparatus () for grating based phase contrast computed tomography. The source-detector arrangement comprises an X-ray source () adapted for rotational movement around a rotation axis (R) relative to an object () and adapted for emittance of an X-ray beam of coherent or quasi-coherent radiation in a line pattern (); and an X-ray detection system () including a first grating element () and a second grating element () and a detector element (); wherein the line pattern of the radiation and a grating direction of the grating elements are arranged orthogonal to the rotation axis; and wherein the first grating element has a first grating pitch varied dependent on a cone angle (β) of the X-ray beam and/or the second grating element has a second grating pitch varied dependent on the cone angle of the X-ray beam.


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