The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2019

Filed:

May. 13, 2016
Applicant:

Stc.unm, Albuquerque, NM (US);

Inventors:

Seung-Chang Lee, Albuquerque, NM (US);

Steven R. J. Brueck, Albuquerque, NM (US);

Assignee:

STC.UNM, Albuquerque, NM (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B81C 1/00 (2006.01); B82Y 10/00 (2011.01); H01L 21/8238 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 27/092 (2006.01); H01L 29/786 (2006.01); H01L 29/06 (2006.01); H01L 21/285 (2006.01); H01L 21/306 (2006.01); H01L 21/311 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H01L 21/02664 (2013.01); B81C 1/00111 (2013.01); B82Y 10/00 (2013.01); H01L 21/02236 (2013.01); H01L 21/02381 (2013.01); H01L 21/02433 (2013.01); H01L 21/02532 (2013.01); H01L 21/02535 (2013.01); H01L 21/02546 (2013.01); H01L 21/02603 (2013.01); H01L 21/02639 (2013.01); H01L 21/02645 (2013.01); H01L 21/02653 (2013.01); H01L 21/2855 (2013.01); H01L 21/30608 (2013.01); H01L 21/31116 (2013.01); H01L 21/823807 (2013.01); H01L 27/092 (2013.01); H01L 29/0673 (2013.01); H01L 29/42392 (2013.01); H01L 29/66742 (2013.01); H01L 29/78681 (2013.01); H01L 29/78684 (2013.01); H01L 29/78696 (2013.01); B82Y 40/00 (2013.01); H01L 27/0922 (2013.01);
Abstract

Provided is a method for growing a nanowire, including: providing a substrate with a base portion having a first surface and at least one support structure extending above or below the first surface; forming a dielectric coating on the at least one support structure; forming a photoresist coating over the substrate; forming a metal coating over at least a portion of the dielectric coating; removing a portion of the dielectric coating to expose a surface of the at least one support structure; removing a portion of the at least one support structure to form a nanowire growth surface; growing at least one nanowire on the nanowire growth surface of a corresponding one of the at least one support structure, wherein the nanowire comprises a root end attached to the growth surface and an opposing, free end extending from the root end; and elastically bending the at least one nanowire.


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