The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2019

Filed:

May. 18, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Lawrence A. Clevenger, Saratoga Springs, NY (US);

Roger Allan Quon, Rhinebeck, NY (US);

Theodorus E. Standaert, Clifton Park, NY (US);

Wei Wang, Yorktown Heights, NY (US);

Chih-Chao Yang, Glenmont, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/322 (2006.01); H01J 37/32 (2006.01); H01L 21/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32422 (2013.01); H01L 21/3003 (2013.01); H01J 2237/335 (2013.01);
Abstract

A multipurpose semiconductor process chamber includes a vessel wall that encloses contiguous first and second volumes of the multipurpose chamber, and means for selectively effectively preventing ions moving across a plane that partitions the first volume from the second volume. For example, the means can include an electromagnet, or at least one permanent magnet, that is operable to impose and remove a magnetic field with field lines extending in the plane.


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