The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2019
Filed:
Jul. 05, 2017
Bong Ouk Choi, Seoul, KR;
Wonseop Lee, Seoul, KR;
Bong Ouk Choi, Seoul, KR;
Wonseop Lee, Seoul, KR;
TG3D STUDIO.INC., Seoul, KR;
Abstract
A method for automatic garment fit customization is provided. The method comprising steps for generating a garment by creating two-dimensional (2D) panels, in which the garment comprises a plurality of garment landmarks (GLMs) and a plurality of garment landmark lines (GLLs), which are key locations and lines on a surface of the garment, simulating draping of the garment on a reference body, where the reference body comprises body landmarks (BLMs) and body landmark lines (BLLs), performing a fit evaluation and calculating misfit measures comprising landmark (LM) misfits, landmark line (LL) misfits, and circumferential misfits, performing a fit adjustment for panel alteration operations modifying some of the 2D panels based on the fit evaluation, performing draping simulation with the modified 2D panels, and repeating until the misfit measures fall within a predetermined criterion and determining customized 2D panels that fit the reference body.