The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2019
Filed:
May. 14, 2018
Applicant:
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Inventors:
Christopher L. Chua, San Jose, CA (US);
Yu Wang, San Jose, CA (US);
David K. Biegelsen, Portola Valley, CA (US);
Patrick Yasuo Maeda, San Jose, CA (US);
Assignee:
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/09 (2006.01); H01L 21/311 (2006.01); H01L 21/78 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0977 (2013.01); G02B 27/0994 (2013.01); H01L 21/02595 (2013.01); H01L 21/31116 (2013.01); H01L 21/31144 (2013.01); H01L 21/78 (2013.01);
Abstract
A light beam shaper has a rectangular cavity bounded by wafer sidewalls and top and bottom caps. The top and bottom caps are wafer-bonded onto opposing surfaces of the wafer. A reflective coating covers inner surfaces of the cavity. A geometry of the cavity changes a light beam entering the cavity into a rectangular beam profile with uniform spatial intensity at the output.