The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2019

Filed:

Jan. 28, 2016
Applicant:

3m Innovative Properties Company, St. Paul, MN (US);

Inventors:

William H. Moser, Edina, MN (US);

Ann R. Fornof, Austin, TX (US);

Guy D. Joly, Shoreview, MN (US);

Serkan Yurt, St. Paul, MN (US);

Larry R. Krepski, White Bear Lake, MN (US);

Ahmed S. Abuelyaman, Woodbury, MN (US);

Afshin Falsafi, Woodbury, MN (US);

Bradley D. Craig, Lake Elmo, MN (US);

Joel D. Oxman, Minneapolis, MN (US);

Babu N. Gaddam, Woodbury, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 22/10 (2006.01); C07F 7/18 (2006.01); C08F 292/00 (2006.01); C09J 4/06 (2006.01); C09D 7/61 (2018.01); A61K 6/00 (2006.01); A61K 6/083 (2006.01); C07C 69/602 (2006.01); C07F 9/09 (2006.01); C09D 4/00 (2006.01); C08K 3/36 (2006.01);
U.S. Cl.
CPC ...
C08F 22/105 (2013.01); A61K 6/0052 (2013.01); A61K 6/0073 (2013.01); A61K 6/083 (2013.01); C07C 69/602 (2013.01); C07F 7/1804 (2013.01); C07F 9/091 (2013.01); C08F 292/00 (2013.01); C09D 4/00 (2013.01); C09D 7/61 (2018.01); C09J 4/06 (2013.01); C08K 3/36 (2013.01);
Abstract

Novel stress-reducing crosslinking oligomers that have application in dental restoratives, thin films, hardcoats, composites, adhesives, and other uses subject to stress reduction are described. The addition-fragmentation process of crosslinking results in a chain-transfer event that provides novel polymers that may be further functionalized. In addition, the addition-fragmentation oligomer comprises pendent functional groups that bond to a substrate by forming an ionic or covalent bond, or etch the substrate by chemically removing some material from the substrate.


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