The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2019

Filed:

Sep. 01, 2015
Applicant:

Evonik Degussa Gmbh, Essen, DE;

Inventors:

Ralf Anselmann, Luedinghausen, DE;

Christian Brinkmoeller, Duelmen, DE;

Arne Hoppe, Essen, DE;

Sonja Merkulov, Marl, DE;

Gerhard Renner, Stockstadt am Rhein, DE;

Assignee:

Evonik Degussa GmbH, Essen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 17/00 (2006.01); C09D 183/04 (2006.01); C23C 18/12 (2006.01); C09D 7/61 (2018.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/42 (2006.01); B05D 1/32 (2006.01); C08K 3/22 (2006.01);
U.S. Cl.
CPC ...
C03C 17/007 (2013.01); C09D 7/61 (2018.01); C09D 183/04 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/32 (2013.01); G03F 7/426 (2013.01); C03C 2217/40 (2013.01); C03C 2217/45 (2013.01); C03C 2217/485 (2013.01); C03C 2218/113 (2013.01); C03C 2218/33 (2013.01); C03C 2218/34 (2013.01); C08K 3/22 (2013.01); C08K 2003/2265 (2013.01);
Abstract

The present invention, relates, to a process, for producing structured coatings, in which a coating composition comprising at least one inorganic binder, at least one oxide pigment which, after addition of a mixture consisting of 15 ml of 1 M oxalic acid and 15 ml of 20% aqueous hydrochloric acid based on 1 g of substance, under standard conditions, leads to a temperature rise of at least 4° C., and at least one solvent is applied to a substrate, the resulting coating composition film is partially coated with a photoresist and the substrate coated with the coating composition and the photoresist is treated with an acid, to the structured layers obtainable by the process and to the use thereof.


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