The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2019
Filed:
Nov. 30, 2016
Samsung Electronics Co., Ltd., Suwon-si, KR;
Sungpil Jang, Hwasung-si, KR;
Minchang Ko, Hwasung-si, KR;
ChangSu Kim, Hwasung-si, KR;
Hangu Kim, Hwasung-si, KR;
Kyoungki Jeon, Hwasung-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
An electrostatic discharge protection device includes: a substrate of a second conductivity type, the substrate including a well of a first conductivity type; a cathode electrode connected to the substrate; a first diffusion region of the second conductivity type and a second diffusion region of the first conductivity type, formed in the substrate and connected to the cathode electrode; an anode electrode connected to the substrate; a third diffusion region of the second conductivity type and a fourth diffusion region of the first conductivity type, formed in the well and connected to the anode electrode; a fifth diffusion region of the first conductivity type, formed on a border of the substrate and the well; and a sixth diffusion region of the first conductivity type, formed in the substrate between the first and second diffusion regions and the fifth diffusion region and configured to receive a bias voltage from outside.