The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2019

Filed:

May. 27, 2015
Applicant:

Opgen, Inc., Gaithersburg, MD (US);

Inventors:

Evan Jones, Potomac, MD (US);

Vadim Sapiro, North Potomac, MD (US);

George Terrance Walker, Chevy Chase, MD (US);

Alex Saeed, Germantown, MD (US);

Assignee:

OpGen, Inc., Gaithersburg, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 33/48 (2006.01); G16B 40/00 (2019.01); G16B 20/00 (2019.01); G16B 45/00 (2019.01); G06G 7/58 (2006.01);
U.S. Cl.
CPC ...
G16B 40/00 (2019.02); G16B 20/00 (2019.02); G16B 45/00 (2019.02);
Abstract

Systems, apparatus, and methods are disclosed for generating a resistome profile for a subject, monitoring an infection state of one or more subjects, and/or identifying a potential infection outbreak at a facility, for example, by obtaining first data representative of at least one measure of antibiotic resistance of an organism from a first sample, identifying the organism, determining at least one of an antibiotic susceptibility phenotype, an identity of an antibiotic resistance gene, and an antibiotic to which the organism is non-susceptible, generating and comparing a first pattern to at least one known pattern to determine and generate a profile uniqueness identifier indicating a degree of similarity above a threshold between the first pattern and the at least one known pattern.


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