The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2019
Filed:
Aug. 07, 2017
University of Cincinnati, Cincinnati, OH (US);
Eric Kreit, Cincinnati, OH (US);
John David Rudolph, Cincinnati, OH (US);
Kenneth A. Dean, Phoenix, AZ (US);
University of Cincinnati, Cincinnati, OH (US);
Abstract
A method for manufacturing a freestanding film having at least one population of through holes cumulatively totaling at least 1% of the film area, wherein the standard deviation of hole diameters is less than 25% and a thickness less than 25 micrometers, The film provides a carrier substrate, a photo-curable material, a release agent and deposits a photo-curable material on the substrate, selectively curing the material and leaving uncured material in the pattern of holes, dissolving away the uncured material and removing the cured material from the carrier substrate. Methods and apparatus are described.