The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2019

Filed:

Jul. 03, 2013
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Kazuyuki Kuroda, Tokyo, JP;

Shin Kitamura, Machida, JP;

Hirokatsu Miyata, Hadano, JP;

Masahiko Takahashi, Hachioji, JP;

Yosuke Kanno, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/118 (2015.01); G02B 1/18 (2015.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G02B 1/118 (2013.01); G02B 1/18 (2015.01); G02B 27/0006 (2013.01); G02B 2207/107 (2013.01); Y10T 428/24355 (2015.01);
Abstract

Provided are an antireflection film having a high antireflection effect and a production process therefor, an optical member excellent in antireflection effect, a water-repellent film having excellent water repellency, a substrate for mass spectrometry having high detection sensitivity, a high-accuracy phase plate, and a fine structure that can be used in the foregoing and a production process therefor. The fine structure is a structure, including multiple conical portions on a surface thereof, in which the conical portions have a mesostructure; and the mesostructure includes a structure having mesopores.


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