The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2019

Filed:

Jun. 23, 2015
Applicant:

Daicel Corporation, Osaka-shi, Osaka, JP;

Inventors:

Tomoya Mizuta, Tokyo, JP;

Keizo Inoue, Himeji, JP;

Assignee:

DAICEL CORPORATION, Osaka-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 65/18 (2006.01); B41J 2/01 (2006.01); B41M 5/00 (2006.01); C08G 59/24 (2006.01); C09D 11/30 (2014.01); C08G 59/68 (2006.01); C09D 11/101 (2014.01); C09D 11/102 (2014.01); C09D 4/00 (2006.01); C09D 11/32 (2014.01);
U.S. Cl.
CPC ...
C08G 65/18 (2013.01); B41J 2/01 (2013.01); B41M 5/00 (2013.01); C08G 59/24 (2013.01); C08G 59/68 (2013.01); C09D 4/00 (2013.01); C09D 11/101 (2013.01); C09D 11/102 (2013.01); C09D 11/30 (2013.01); C09D 11/32 (2013.01);
Abstract

Provided is a monomer composition that has rapid curability and can be cured rapidly, even in the presence of oxygen and/or water, to form a cured product having excellent adhesion to a wide variety of substrates. The monomer composition according to the present invention contains a vinyl ether compound (A). The vinyl ether compound (A) includes a vinyl ether compound (a) having a cyclic ether skeleton. The monomer composition further contains at least one compound selected from the group consisting of a vinyl ether compound (a') having a chain hydrocarbon skeleton, a divinyl ether compound (a″-1) having a cyclic hydrocarbon skeleton, an oxetane compound (B), and an epoxy compound (C).


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