The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2019
Filed:
May. 19, 2016
Applicants:
Joey L. Mead, Carlisle, MA (US);
Carol M. F. Barry, Tyngsborough, MA (US);
John Shearer, Franklin, PA (US);
Artee Panwar, Wilmington, MA (US);
Jinde Zhang, Lowell, MA (US);
Nischay Kodihalli Shivaprakash, Lowell, MA (US);
Inventors:
Joey L. Mead, Carlisle, MA (US);
Carol M. F. Barry, Tyngsborough, MA (US);
John Shearer, Franklin, PA (US);
Artee Panwar, Wilmington, MA (US);
Jinde Zhang, Lowell, MA (US);
Nischay Kodihalli Shivaprakash, Lowell, MA (US);
Assignee:
The University of Massachusetts, Boston, MA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 59/02 (2006.01); B29C 59/04 (2006.01); G03F 7/00 (2006.01); B29K 101/12 (2006.01); B29K 105/00 (2006.01);
U.S. Cl.
CPC ...
B29C 59/022 (2013.01); B29C 59/04 (2013.01); G03F 7/0002 (2013.01); B29C 2059/023 (2013.01); B29K 2101/12 (2013.01); B29K 2105/256 (2013.01);
Abstract
Methods and systems for manufacturing re-entrant structures, such as the structures exhibiting superomniphobic characteristic, in a continuous, well-controlled, high-rate (mass production, volume) manner are disclosed.