The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2019
Filed:
May. 06, 2015
Applicant:
Luxembourg Institute of Science and Technology (List), Esch/Alzette, LU;
Inventors:
Nicolas Boscher, Auden le Tiche, FR;
Patrick Choquet, Longeville les Metz, FR;
David Duday, Luxembourg, LU;
Florian Hilt, Hettange Grande, FR;
Assignee:
Luxembourg Institute of Science and Technology (LIST), Esch/Alzette, LU;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 1/00 (2006.01); B05D 3/04 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
B05D 1/62 (2013.01); H01J 37/32192 (2013.01); H01J 37/32348 (2013.01); B05D 3/0486 (2013.01); H01J 2237/3321 (2013.01);
Abstract
The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.